Plasma Cleaning With Vacuum / Atmospheric Plasmas

Topic: Plasma cleaning of organic contaminants from high quality reflective surfaces using vacuum and/or atmospheric pressure plasmas. (12 month employment)
Detailed summary: High quality mirrors are used in next generation lithography systems to reflect light at 13.5nm wavelength used to image the nanoelectronic devices of the future. Although the mirrors are in vacuum, gas contaminants still deposit carbon on their high quality surfaces reducing reflectivity. Plasma processes in vacuum or …

This position, Plasma Cleaning With Vacuum / Atmospheric Plasmas, was posted on August 24, 2011. Since this job has been published, it has been viewed 56 times.